Thin film equipment uses vacuum processing for the modification of surfaces using CVD, PVD, plasma etching, and thermal oxidation or ion implantation.

Coating equipment is used to apply organic, inorganic or metal coatings onto part surfaces for industrial applications.

Industrial gas generation equipment is used to generate or dissociate gases for industrial processes.

Thin film sources consist of magnetrons, evaporation thermal units, ion beams and other sources that produce deposition materials (vapors or ions) in a thin film system.

Thin film process monitors are used to control thin film deposition rate or composition during processing.