Plasma power supplies are direct current (DC) and radio frequency (RF) devices used in plasma generation equipment for applications such as sputtering, plasma etching, physical vapor deposition (PVD) coating, and chemical vapor deposition (CVD) coating. To achieve optimum sputtering conditions, a plasma generator modifies plasma properties, especially ion density. Plasma etching removes organic and inorganic contamination, increases wettability and bond strength, and removes residue from a variety of materials. Plasma equipment is used under precisely controlled conditions, without the safety hazards and liquid wastes associated with wet cleaning and etching. Plasma power supplies can be used for thermal spray coating, metal cutting/welding, steel melting and remelting, waste remediation, and tundish heating.